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ASML nearly ready to ship first EUV lithography scanner

by on07 September 2023

It will be out later this year

ASML is on track to ship the industry's first extreme ultraviolet (EUV) lithography scanner with a 0.55 numerical aperture (NA) this year.

Company CEO Peter Wennink said that ASML's Twinscan EXE:5000 machine will be used for development purposes and familiarising the company's customers with the new technology. It will be used in anger from 2025. 

Wennink said a few suppliers had some difficulties ramping up and giving us the right level of technological quality, which led to some delays. However, everything is still on schedule for the year-end.

This year, ASML will ship its Twinscan EXE:5000 scanner to one customer -- probably Chipzilla. Intel will likely adopt ASML's high-NA tools for its post-18A process technologies, while TSMC and Samsung will use them later.

The scanners will cost each company $300 million per unit, raising the costs of leading-edge fabs.

The new 0.55 NA EUV tools will not supplant the existing deep ultraviolet (DUV) and EUV equipment. ASML will keep advancing its DUV and 0.33 NA EUV scanners. High-NA EUV lithography is expected to play a pivotal role in shrinking transistor dimensions and boosting performance.

Last modified on 07 September 2023
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